Guoyi's RepositoryAn integrated laser lithography control system developed by the Nanomaterials Research Lab, NUS
Author: Chen Guoyi, Sun Yudong, Wu Mingsong, Lan Ziying
Principal Investigators: Sharon Xiaodai Lim, Sow Chorng Haur
DOI: 10.5281/zenodo.13119830
This open-sourced project is sponsored by the NUS Department of Physics.
Welcome to the Integrated Laser Control Operating System (ILCOS), an advanced laser lithography control system developed by the Nanomaterials Research Lab at the National University of Singapore. Sponsored by the Department of Physics at the National University of Singapore, ILCOS combines hardware and software to deliver precise control over laser lithography processes with nanometer precision.
ILCOS features a robust framework that includes a high-precision vector control mechanism, leveraging the capabilities of the Physcript™ Laser Control Script (.lcs), a specialized programming language designed specifically for laser lithography. This system is engineered to ensure both the safety and efficiency of the lithography process, integrating real-time performance analysis to optimize vectorization of laser actions with minimal loss.
The core of ILCOS is its laser hardware control and software compilation units, which work in harmony to parse and execute the Physcript™ Laser Control Script. The .lcs language, though inspired by C, incorporates critical safety and real-time performance enhancements, isolating potentially unsafe features at the escaping and compiling levels to ensure secure operations. This results in a syntax that, while familiar, is tailored specifically for the unique requirements of nanometer-scale laser control.
Additionally, ILCOS offers an online simulation environment through its Physcript™ .lcs Online Simulator, enabling users to compile and execute .lcs code in a virtual setting. This online platform provides valuable insights into potential lithography outcomes, allowing users to visualize and refine their processes before actual implementation.
ILCOS represents a comprehensive, integrated solution for high-precision laser lithography, embodying a seamless blend of cutting-edge technology and innovative design to support advanced research and development in nanomaterials.
Chapter 1: Hardware Architecture Next >