➤ comp.nus.edu.sg/~guoyi / project / ilcos / demo

PhyScript™ Integrated Laser Control Operating System

An integrated laser lithography control system developed by the Nanomaterials Research Lab, NUS

Author: Chen Guoyi, Sun Yudong, Wu Mingsong, Lan Ziying
Principal Investigators: Sharon Xiaodai Lim, Sow Chorng Haur
DOI: 10.5281/zenodo.13119830

This open-sourced project is sponsored by the NUS Department of Physics.

Ziying's Demo

Welcome to the demonstration. Here, you will see works created by Lan Ziying using .lcs mathematical expressions and iterative functions. These expressions have successfully rendered complex geometric patterns on the PhyScript™ Integrated Laser Control Operating System (ilcos), demonstrating that with the right mathematical expressions, the system can precisely lithograph intricate 2D images. On this page, we provide the drawing code for common geometric shapes for your reference and learning, to assist you in your final engineering projects.

Before reviewing the code on this page, please ensure that you have read Chapter 3: .lcs Coding Standards and have successfully completed the quizzes at the end of that chapter.


Nanomaterials Research Lab's Logo

The Nanomaterials Research Lab's logo is a complex design that features a combination of geometric shapes: a central hexagon, two solid circles, two semicircles, and a diagonal line intersecting the hexagon. Each element of this logo was meticulously crafted using the high-precision trigonometric functions and iterative logic available in .lcs, ensuring accurate dimensions and alignments.

The hexagon serves as the focal point, with the diagonal line adding a dynamic element to the design. The solid circles and semicircles are strategically positioned to complement the hexagon, creating a balanced and visually appealing logo. Our approach involved carefully calculating the coordinates and angles required for each shape, allowing us to precisely assemble them in the coordinate system.

This process enabled us to render the logo at a nanoscale with exceptional accuracy, showcasing the capabilities of the .lcs system for high-precision geometric design. To gain a deeper understanding of the design process and observe each step, please click on the image on the right to view a GIF of the drawing process.

封面图

Initial Setup

 laser(0)
 mvAbs(150,200+100*sin<pi/3>)
 laser(255)
  • laser(0): Turns off the laser to move to the starting position without marking the substrate.
  • mvAbs(150,200+100*sin<pi/3>): Moves the laser to the initial position of the top vertex of the hexagon.
  • laser(255): Turns the laser on at maximum power to start drawing.

Drawing the Hexagon

 x=150~250 BEGIN
    mvAbs(x,200+100*sin<pi/3>)
 END
  • Purpose: Draws the top horizontal side of the hexagon.
  • Iteration: Moves the laser horizontally from x=150 to x=250, keeping the y-coordinate constant.
 x=250~300 BEGIN
    mvAbs(x,200+600*sin<pi/3>-2*sin<pi/3>*x)
 END
  • Purpose: Draws the upper-right side of the hexagon.
  • Calculation: Uses a decreasing y-coordinate to form a diagonal line.
 x=300~250 BEGIN
    mvAbs(x,2*sin<pi/3>*x+200-600*sin<pi/3>)
 END
  • Purpose: Draws the lower-right side of the hexagon.
  • Calculation: Continues the diagonal line to the bottom right vertex.
 x=250~150 BEGIN
    mvAbs(x,200-100*sin<pi/3>)
 END
  • Purpose: Draws the bottom horizontal side of the hexagon.
  • Calculation: Moves left with a constant y-coordinate.
 x=150~100 BEGIN
    mvAbs(x,200+200*sin<pi/3>-2*sin<pi/3>*x)
 END
  • Purpose: Draws the lower-left side of the hexagon.
  • Calculation: Moves diagonally upwards.
 x=100~150 BEGIN
    mvAbs(x,2*sin<pi/3>*x+200-200*sin<pi/3>)
 END
  • Purpose: Draws the upper-left side of the hexagon.
  • Calculation: Returns to the starting point to complete the hexagon.
 x=150~250 BEGIN
    mvAbs(x,200+400*sin<pi/3>-2*sin<pi/3>*x)
 END
  • Purpose: Draws a diagonal line through the hexagon.
  • Calculation: Adds a dynamic element across the hexagon.

Drawing Circles

Right Circle

 laser(0)
 mvAbs(240,200-100*sin<pi/3>)
 laser(255)
 j=1~361 BEGIN
    mvAbs(250-10*cos<j*pi/180>,200-100*sin<pi/3>+10*sin<j*pi/180>)
 END
  • Starting Position: Moves to the center of the right circle.
  • Drawing: Uses a loop to draw a circle with a radius of 10 units.

Adjusting for the Left Circle

To draw the left circle, adjust the starting position to the left side. Use the same logic but update the x-coordinate in the mvAbs function. 

 laser(0)
 mvAbs(140,200+100*sin<pi/3>)
 laser(255)
 j=1~361 BEGIN
    mvAbs(150-10*cos<j*pi/180>,200+100*sin<pi/3>+10*sin<j*pi/180>)
 END

Drawing Semicircles

Lower Semicircle

 laser(0)
 mvAbs(400-200*sin<pi/3>,200)
 laser(255)
 j=1~61 BEGIN
    mvAbs(400-200*sin<pi/3>*cos<j*pi/180>,200+200*sin<pi/3>*sin<j*pi/180>)
 END
  • Position: Moves to the center of the lower semicircle.
  • Drawing: Draws the first half of the semicircle using angles 1 to 60 degrees.
 laser(0)
 mvAbs(400-200*sin<pi/3>,200)
 laser(255)
 j=361~301 BEGIN
    mvAbs(400-200*sin<pi/3>*cos<j*pi/180>,200+200*sin<pi/3>*sin<j*pi/180>)
 END
  • Purpose: Completes the lower semicircle by drawing the remaining arc.

Adjusting for the Upper Semicircle

For the upper semicircle, start at the appropriate coordinates above the hexagon. Update the center position and repeat the semicircle drawing logic. 

 laser(0)
 mvAbs(200*sin<pi/3>,200)
 laser(255)
 j=1~61 BEGIN
    mvAbs(200*sin<pi/3>*cos<j*pi/180>,200+200*sin<pi/3>*sin<j*pi/180>)
 END


Apple Logo

The Apple logo is composed of multiple circles, with each circle's radius corresponding to a number from the Fibonacci sequence. In addition to these standard radii, the design includes circles with radii specified to several decimal places, which are calculated through precise geometric methods, typically involving the tangency of two or three circles.

We begin by arranging the circles in a specific pattern, then transform certain circles into curves by adding iterative constraints. This process allows us to combine these shapes into the form of the Apple logo. The entire design consists of sixteen circles meticulously arranged to form the iconic shape of the Apple logo.

This process enabled us to render the logo at a nanoscale with exceptional accuracy, showcasing the capabilities of the .lcs system for high-precision geometric design.

To gain a deeper understanding of the design process and observe each step, please click on the image on the right to view a GIF of the drawing process.

封面图

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